Doping density, not valency, influences catalytic metal-assisted plasma etching of silicon. (2023)

First Author: Sun JB

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1039/d3mh00649b

PubMed Identifier: 37350303

Publication URI: http://europepmc.org/abstract/MED/37350303

Type: Journal Article/Review

Volume: 10

Parent Publication: Materials horizons

Issue: 9

ISSN: 2051-6347