Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing (2024)

First Author: Frechilla A

Attributed to: Precision Manufacturing of Flexible CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apmt.2023.102033

Publication URI: http://dx.doi.org/10.1016/j.apmt.2023.102033

Type: Journal Article/Review

Parent Publication: Applied Materials Today

ISSN: 2352-9407