In-situ monitoring of microwave plasma-enhanced chemical vapour deposition diamond growth on silicon using spectroscopic ellipsometry (2023)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.carbon.2022.10.049

Publication URI: http://dx.doi.org/10.1016/j.carbon.2022.10.049

Type: Journal Article/Review

Parent Publication: Carbon

ISSN: 00086223