Plasma enhanced chemical vapor deposition of p-type Cu2O from metal organic precursors (2022)

First Author: Gomersall D

Attributed to: Precision Manufacturing of Flexible CMOS funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.17863/cam.84417

Publication URI: https://www.repository.cam.ac.uk/handle/1810/336997

Type: Journal Article/Review