High-density remote plasma sputtering of high-dielectric-constant amorphous hafnium oxide films (2013)

First Author: Li F

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/pssb.201248520

Publication URI: http://dx.doi.org/10.1002/pssb.201248520

Type: Journal Article/Review

Parent Publication: physica status solidi (b)

Issue: 5