Photolithographic patterning of bihelical tracks onto conical substrates (2007)
Attributed to:
Maskless Non-Planar Photolithography (3DML)
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1117/1.2824377
Publication URI: http://dx.doi.org/10.1117/1.2824377
Type: Journal Article/Review
Parent Publication: Journal of Micro/Nanolithography, MEMS, and MOEMS
Issue: 4