Analytical Models for Three-Dimensional Ion Implantation Profiles in FinFETs (2013)

First Author: Wang L
Attributed to:  Atomic Scale Simulation of Nanoelectronic Devices funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/tcad.2013.2277975

Publication URI: http://dx.doi.org/10.1109/tcad.2013.2277975

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Issue: 12