Novel x-ray interferometers for length metrology
Lead Research Organisation:
CRANFIELD UNIVERSITY
Department Name: Sch of Aerospace, Transport & Manufact
Abstract
Overview
Achieving sub-nanometre positioning accuracy is essential for the development of modern semiconductor and quantum-based devices, where performance relies heavily on nanoscale precision. To enable this, the silicon lattice parameter has been formally adopted as the length scale standard for nano-metrology. A practical approach to realising this standard is X-ray interferometry, which functions as a high-precision ruler with subatomic accuracy.
Aim
This project aims to efficiently design and manufacture X-ray interferometers suitable for a range of nanometrology applications, including ultra-precision positioning and nanoscale displacement sensor characterisation. These advancements will enhance the manufacturing capabilities of microelectronics and quantum devices.
Scope
Manufacturing these interferometers is highly complex, requiring expertise in machining brittle materials, fabricating high-aspect ratio structures, and minimising surface damage during machining.
To develop the X-ray interferometer efficiently, a structured, sequential approach will be used:
1. Design Phase - Finite element modelling (FEM) will be used to design ultra-high-accuracy flexure stages.
2. Optimisation - The FEM model will serve as the foundation for a digital twin, allowing optimisation of machining parameters and flexure functionality across various geometries and conditions.
3. Fabrication & Assessment - The optimised flexure will be machined from silicon, followed by an evaluation of its mechanical properties and performance.
This approach ensures a streamlined, efficient, and fit-for-purpose manufacturing process.
Objectives
1. Literature Review - Analyse state-of-the-art flexure design and manufacturing for silicon-based substrates.
2. Flexure Modelling - Develop analytical and FEM-based flexure models (digital twin), establish machining tolerances, and validate flexure movement assumptions experimentally for a simple case.
3. Manufacturing Strategy - Define key performance criteria and develop optimised manufacturing strategies for the flexure.
4. Prototype Development - Manufacture a prototype flexure and evaluate its performance in a typical X-ray interferometer setup.
Achieving sub-nanometre positioning accuracy is essential for the development of modern semiconductor and quantum-based devices, where performance relies heavily on nanoscale precision. To enable this, the silicon lattice parameter has been formally adopted as the length scale standard for nano-metrology. A practical approach to realising this standard is X-ray interferometry, which functions as a high-precision ruler with subatomic accuracy.
Aim
This project aims to efficiently design and manufacture X-ray interferometers suitable for a range of nanometrology applications, including ultra-precision positioning and nanoscale displacement sensor characterisation. These advancements will enhance the manufacturing capabilities of microelectronics and quantum devices.
Scope
Manufacturing these interferometers is highly complex, requiring expertise in machining brittle materials, fabricating high-aspect ratio structures, and minimising surface damage during machining.
To develop the X-ray interferometer efficiently, a structured, sequential approach will be used:
1. Design Phase - Finite element modelling (FEM) will be used to design ultra-high-accuracy flexure stages.
2. Optimisation - The FEM model will serve as the foundation for a digital twin, allowing optimisation of machining parameters and flexure functionality across various geometries and conditions.
3. Fabrication & Assessment - The optimised flexure will be machined from silicon, followed by an evaluation of its mechanical properties and performance.
This approach ensures a streamlined, efficient, and fit-for-purpose manufacturing process.
Objectives
1. Literature Review - Analyse state-of-the-art flexure design and manufacturing for silicon-based substrates.
2. Flexure Modelling - Develop analytical and FEM-based flexure models (digital twin), establish machining tolerances, and validate flexure movement assumptions experimentally for a simple case.
3. Manufacturing Strategy - Define key performance criteria and develop optimised manufacturing strategies for the flexure.
4. Prototype Development - Manufacture a prototype flexure and evaluate its performance in a typical X-ray interferometer setup.
People |
ORCID iD |
| Emily CACHIA (Student) |
Studentship Projects
| Project Reference | Relationship | Related To | Start | End | Student Name |
|---|---|---|---|---|---|
| EP/Y528535/1 | 30/09/2023 | 29/09/2029 | |||
| 2880824 | Studentship | EP/Y528535/1 | 30/09/2023 | 23/09/2027 | Emily CACHIA |