Sub-Micron 3D Holographic Lithography.

Lead Research Organisation: University of Sheffield
Department Name: Electronic and Electrical Engineering


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Description The work related to creating focussed patterns (in light, using holographic mask and) on non-planar surfaces as part of a lithographic manufacturing process (widely used in electronic manufacturing) to extend the range of cases that we can deal with (the basic technology having been developed previously). In particular: to extend the range of resolutions of features that can be created to below one micron; to improve the quality of patterns created; and to demonstrate these improvements. We were able to create sub-micron lines; extended an iterative method for generating the holograms for 3D patterns; create patterns oriented orthogonal to the holograms; and create and characterise a spherical, meander antenna, a relatively-complex pattern - requiring significant optimisation of the hologram involved.
Exploitation Route The patterning of patterns orthogonal to the holograms should allow the creation of tracks down the edge of ICs in packaging applications. The improvement in the complexity of holograms created will allow more complex patterning to be created in electronic manufacturing in an increasingly non-planar environment.
Sectors Aerospace, Defence and Marine,Digital/Communication/Information Technologies (including Software),Electronics,Manufacturing, including Industrial Biotechology

Description We have established the mechanism allowing patterns to be structured via holographic lithography using electro-mechanical and electro-optical devices to create dynamic holograms. Rather than using traditional fixed holograms to create pools of light energy in space, we have used micromirror arrays and Liquid Crystal on Silicon (LCOS) arrays to create holograms that can be controlled dynamically. These holograms can be used to create pools of light in space that conform over non-planar surfaces. We have had discussions with a manufacturer of proximity mask aligners (Suss Micro-Optik) who have been interested in applying our techniques to extending the range of focussing for proximity mask aligners to the order of mms. However, this cannot really be described as an impact yet.
Sector Cultural
Description EPSRC - Pathways to Impact
Amount £10,067 (GBP)
Funding ID URMS: 120273 
Organisation Engineering and Physical Sciences Research Council (EPSRC) 
Sector Public
Country United Kingdom
Start 01/2011 
End 03/2011
Description Knowledge Transfer Account - Proof of Concept
Amount £49,337 (GBP)
Funding ID KTA PoC URMS: 131233 
Organisation University of Sheffield 
Sector Academic/University
Country United Kingdom
Start 06/2011 
End 06/2012