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The behaviour of oxygen at metal electrodes in HfO2 based resistive switching devices (2013)

First Author: Bradley S

Attributed to: Non-equilibrium electron-ion dynamics in thin metal-oxide films funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2013.03.132

Publication URI: http://dx.doi.org/10.1016/j.mee.2013.03.132

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering