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Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of microwave plasma and hot filament chemical vapor deposition reactors (2010)

First Author: May P

Attributed to: Experiment and modelling of the growth of CVD diamond: towards a detailed understanding of growth chemistry and mechanisms funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.3516498

Publication URI: http://dx.doi.org/10.1063/1.3516498

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 11