A thermalization energy analysis of the threshold voltage shift in amorphous indium gallium zinc oxide thin film transistors under simultaneous negative gate bias and illumination (2014)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4870457
Publication URI: http://dx.doi.org/10.1063/1.4870457
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 13