(Invited) Interface Engineering Routes for a Future CMOS Ge-Based Technology (2014)
Attributed to:
High permittivity dielectrics on Ge for end of Roadmap application
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1149/06102.0073ecst
Publication URI: http://dx.doi.org/10.1149/06102.0073ecst
Type: Journal Article/Review
Parent Publication: ECS Transactions
Issue: 2