Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition (2013)
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/cm402422e
PubMed Identifier: 24489437
Publication URI: http://europepmc.org/abstract/MED/24489437
Type: Journal Article/Review
Parent Publication: Chemistry of Materials
Issue: 23
ISSN: 0897-4756