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Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition (2013)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/cm402422e

PubMed Identifier: 24489437

Publication URI: http://europepmc.org/abstract/MED/24489437

Type: Journal Article/Review

Parent Publication: Chemistry of Materials

Issue: 23

ISSN: 0897-4756