Highly Selective Chemical Vapor Deposition of Tin Diselenide Thin Films onto Patterned Substrates via Single Source Diselenoether Precursors (2012)
Attributed to:
Phase Change Memory Materials via Non-Aqueous Electrodeposition into Nano-structured Templates
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1021/cm302864x
Publication URI: http://dx.doi.org/10.1021/cm302864x
Type: Journal Article/Review
Parent Publication: Chemistry of Materials
Issue: 22