📣 Try out the NEW Gateway to Research and let us know what you think.

We're looking for users to test the new service during August and September and share their feedback. Express your interest by completing this short form.

Modeling the impact of process variation on resistive bridge defects (2010)

First Author: Khursheed S

Attributed to: Variation-Aware Test for NanoScale CMOS Integrated Circuits funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/test.2010.5699230

Publication URI: http://dx.doi.org/10.1109/test.2010.5699230

Type: Conference/Paper/Proceeding/Abstract

ISBN: 978-1-4244-7206-2