Modeling the impact of process variation on resistive bridge defects (2010)
Attributed to:
Variation-Aware Test for NanoScale CMOS Integrated Circuits
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1109/test.2010.5699230
Publication URI: http://dx.doi.org/10.1109/test.2010.5699230
Type: Conference/Paper/Proceeding/Abstract
ISBN: 978-1-4244-7206-2