Dry etching of N-face GaN using two high-density plasma etch techniques (2007)
Attributed to:
Materials Challenges in GaN-based Light Emitting Structures
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/pssc.200673515
Publication URI: http://dx.doi.org/10.1002/pssc.200673515
Type: Journal Article/Review
Parent Publication: physica status solidi c
Issue: 1