Dry etching of N-face GaN using two high-density plasma etch techniques (2007)

First Author: Rizzi F

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1002/pssc.200673515

Publication URI: http://dx.doi.org/10.1002/pssc.200673515

Type: Journal Article/Review

Parent Publication: physica status solidi c

Issue: 1