Very low dislocation density, resistive GaN films obtained using transition metal nitride interlayers (2008)
Abstract
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Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/pssa.200778608
Publication URI: http://dx.doi.org/10.1002/pssa.200778608
Type: Journal Article/Review
Parent Publication: physica status solidi (a)
Issue: 5