Very low dislocation density, resistive GaN films obtained using transition metal nitride interlayers (2008)
Attributed to:
Materials Challenges in GaN-based Light Emitting Structures
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1002/pssa.200778608
Publication URI: http://dx.doi.org/10.1002/pssa.200778608
Type: Journal Article/Review
Parent Publication: physica status solidi (a)
Issue: 5