High aspect subdiffraction-limit photolithography via a silver superlens. (2012)

First Author: Liu H

Attributed to: New Tools for Nanometrology funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/nl2044088

PubMed Identifier: 22375712

Publication URI: http://europepmc.org/abstract/MED/22375712

Type: Journal Article/Review

Volume: 12

Parent Publication: Nano letters

Issue: 3

ISSN: 1530-6984