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Analysis of thin impurity doped layers in anodic alumina and anodic tantala films by glow discharge time-of-flight mass spectrometry (2013)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1179/174591910x12692576434617

Publication URI: http://dx.doi.org/10.1179/174591910x12692576434617

Type: Journal Article/Review

Parent Publication: Transactions of the IMF

Issue: 3