CD uniformity improvement on the self-aligned spacer double-patterning process by resist material modification (2012)

First Author: Ohmori Katsumi
Attributed to:  Cardiff PATT Rolling Grant funded by STFC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1117/12.916321

Publication URI: http://dx.doi.org/10.1117/12.916321

Type: Journal Article/Review

Volume: 8325

Parent Publication: Advances in Resist Materials and Processing Technology XXIX