Broadband near-infrared emission from bismuth doped silicon oxide films prepared by ion-implantation (2012)

First Author: Halsall M
Attributed to:  Silicon emission technologies based on nanocrystals funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/commad.2012.6472341

Publication URI: http://dx.doi.org/10.1109/commad.2012.6472341

Type: Conference/Paper/Proceeding/Abstract

ISBN: 978-1-4673-3047-3