The effect of increasing V content on the structure, mechanical properties and oxidation resistance of Ti-Si-V-N films deposited by DC reactive magnetron sputtering (2014)

First Author: Fernandes F
Attributed to:  Micro Materials NanoTest Vantage Testing Suite with NTX4Controller funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.apsusc.2013.10.117

Publication URI: http://dx.doi.org/10.1016/j.apsusc.2013.10.117

Type: Journal Article/Review

Parent Publication: Applied Surface Science