Microstructure and mechanical properties of physical vapor deposited Cu/W nanoscale multilayers: Influence of layer thickness and temperature (2014)

First Author: Monclús M

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.tsf.2014.05.044

Publication URI: http://dx.doi.org/10.1016/j.tsf.2014.05.044

Type: Journal Article/Review

Parent Publication: Thin Solid Films