Diffusion and activation of dopants in silicon and advanced silicon-based materials (2006)
Attributed to:
University of Surrey Ion Beam Centre
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0031-8949/2006/t126/021
Publication URI: http://dx.doi.org/10.1088/0031-8949/2006/t126/021
Type: Journal Article/Review
Parent Publication: Physica Scripta