Effect of amorphization and carbon co-doping on activation and diffusion of boron in silicon (2006)

First Author: Pawlak B

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2227863

Publication URI: http://dx.doi.org/10.1063/1.2227863

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 6