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Vacancy-engineering implants for high boron activation in silicon on insulator (2006)

First Author: Smith A

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2178487

Publication URI: http://dx.doi.org/10.1063/1.2178487

Type: Journal Article/Review

Parent Publication: Applied Physics Letters

Issue: 8