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Uphill diffusion of ultralow-energy boron implants in preamorphized silicon and silicon-on-insulator (2007)

First Author: Ferri M

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.2812676

Publication URI: http://dx.doi.org/10.1063/1.2812676

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 10