Correlation of local structure and electrical activation in arsenic ultrashallow junctions in silicon (2008)

First Author: Giubertoni D

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.3026706

Publication URI: http://dx.doi.org/10.1063/1.3026706

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 10