Differential Hall characterisation of ultrashallow doping in advanced Si-based materials (2008)
Attributed to:
University of Surrey Ion Beam Centre
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1016/j.mseb.2008.10.003
Publication URI: http://dx.doi.org/10.1016/j.mseb.2008.10.003
Type: Journal Article/Review
Parent Publication: Materials Science and Engineering: B