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Raman scattering studies of ultrashallow Sb implants in strained Si (2007)

First Author: O'Reilly L

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1007/s10854-007-9339-9

Publication URI: http://dx.doi.org/10.1007/s10854-007-9339-9

Type: Journal Article/Review

Parent Publication: Journal of Materials Science: Materials in Electronics

Issue: 4