Stressed solid-phase epitaxial growth of ion-implanted amorphous silicon (2008)

First Author: Rudawski N

Attributed to: University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mser.2008.02.002

Publication URI: http://dx.doi.org/10.1016/j.mser.2008.02.002

Type: Journal Article/Review

Parent Publication: Materials Science and Engineering: R: Reports

Issue: 1-6