Deactivation of submelt laser annealed arsenic ultrashallow junctions in silicon during subsequent thermal treatment (2010)

First Author: Giubertoni D
Attributed to:  University of Surrey Ion Beam Centre funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1116/1.3242637

Publication URI: http://dx.doi.org/10.1116/1.3242637

Type: Journal Article/Review

Parent Publication: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Issue: 1