Long Wavelength {greater than or equal to}1.9 µm Germanium for Optoelectronics Using Process Induced Strain (2013)
Attributed to:
Creating Silicon Based Platforms for New Technologies
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1149/05009.0779ecst
Publication URI: http://dx.doi.org/10.1149/05009.0779ecst
Type: Journal Article/Review
Parent Publication: ECS Transactions
Issue: 9