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Scaling of metal gate workfunction variability in nanometer SOI-FinFETs (2014)

First Author: Indalecio G

Attributed to: Multiscale Modelling of Metal-Semiconductor Contacts for the Next Generation of Nanoscale Transistors funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/ulis.2014.6813927

Publication URI: http://dx.doi.org/10.1109/ulis.2014.6813927

Type: Conference/Paper/Proceeding/Abstract