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A high resolution water soluble fullerene molecular resist for electron beam lithography. (2008)

First Author: Chen X

Attributed to: Materials Program Platform Grant: Nanostructured Surfaces funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0957-4484/19/27/275308

PubMed Identifier: 21828704

Publication URI: http://europepmc.org/abstract/MED/21828704

Type: Journal Article/Review

Volume: 19

Parent Publication: Nanotechnology

Issue: 27

ISSN: 0957-4484