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Electron beam lithography using plasma polymerized hexane as resist (2010)

First Author: Pedersen R

Attributed to: A tool for investigating cell-material interactions: surface chemical and topographical gradients funded by BBSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2009.11.043

Publication URI: http://dx.doi.org/10.1016/j.mee.2009.11.043

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering

Issue: 5-8