Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist (2010)

First Author: Toriz-Garcia J

Attributed to: Sub-Micron 3D Holographic Lithography. funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1088/0960-1317/20/1/015012

Publication URI: http://dx.doi.org/10.1088/0960-1317/20/1/015012

Type: Journal Article/Review

Parent Publication: Journal of Micromechanics and Microengineering

Issue: 1

ISSN: 0960-1317