Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist (2010)
Attributed to:
Sub-Micron 3D Holographic Lithography.
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0960-1317/20/1/015012
Publication URI: http://dx.doi.org/10.1088/0960-1317/20/1/015012
Type: Journal Article/Review
Parent Publication: Journal of Micromechanics and Microengineering
Issue: 1
ISSN: 0960-1317