Ion energy distributions and efficiency of sputtering process in HIPIMS system (2008)
Attributed to:
Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1088/0022-3727/41/11/115306
Publication URI: http://dx.doi.org/10.1088/0022-3727/41/11/115306
Type: Journal Article/Review
Parent Publication: Journal of Physics D: Applied Physics
Issue: 11