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Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films (2011)

First Author: Ehiasarian A

Attributed to: Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1063/1.3579443

Publication URI: http://dx.doi.org/10.1063/1.3579443

Type: Journal Article/Review

Parent Publication: Journal of Applied Physics

Issue: 10