Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films (2011)
Attributed to:
Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS) - Plasma Studies and Materials Synthesis
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.3579443
Publication URI: http://dx.doi.org/10.1063/1.3579443
Type: Journal Article/Review
Parent Publication: Journal of Applied Physics
Issue: 10