A novel, organic, UV-sensitive resist ideal for nanoimprint-, photo- and laser lithography in an air atmosphere (2015)

First Author: Greer A

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1007/s13391-015-4401-x

Publication URI: http://dx.doi.org/10.1007/s13391-015-4401-x

Type: Journal Article/Review

Parent Publication: Electronic Materials Letters

Issue: 4