Electron beam lithography tri-layer lift-off to create ultracompact metal/metal oxide 2D patterns on CaF2 substrate for surface-enhanced infrared spectroscopy (2015)

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1016/j.mee.2015.01.041

Publication URI: http://dx.doi.org/10.1016/j.mee.2015.01.041

Type: Journal Article/Review

Parent Publication: Microelectronic Engineering