Ultrafast Electron and Hole Relaxation Pathways in Few-Layer MoS 2 (2015)

First Author: Nie Z
Attributed to:  EPSRC Centre for Innovative Manufacturing in Photonics funded by EPSRC

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1021/acs.jpcc.5b05048

Publication URI: http://dx.doi.org/10.1021/acs.jpcc.5b05048

Type: Journal Article/Review

Parent Publication: The Journal of Physical Chemistry C

Issue: 35