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Comparison of Fin-Edge Roughness and Metal Grain Work Function Variability in InGaAs and Si FinFETs (2016)

First Author: Seoane N

Abstract

No abstract provided

Bibliographic Information

Digital Object Identifier: http://dx.doi.org/10.1109/ted.2016.2516921

Publication URI: http://dx.doi.org/10.1109/ted.2016.2516921

Type: Journal Article/Review

Parent Publication: IEEE Transactions on Electron Devices

Issue: 3