Novel Molecular Resist for EUV and Electron Beam Lithography (2015)
Attributed to:
High-resolution Electron Beam Lithography Critical Mass Grant
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.2494/photopolymer.28.537
Publication URI: http://dx.doi.org/10.2494/photopolymer.28.537
Type: Journal Article/Review
Parent Publication: Journal of Photopolymer Science and Technology
Issue: 4