Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics (2015)
Attributed to:
Manufacturing with Light - photochemical ALD to manufacture functional thin films
funded by
EPSRC
Abstract
No abstract provided
Bibliographic Information
Digital Object Identifier: http://dx.doi.org/10.1063/1.4905887
Publication URI: http://dx.doi.org/10.1063/1.4905887
Type: Journal Article/Review
Parent Publication: AIP Advances
Issue: 1
ISSN: 21583226